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技術資訊/Information

15
電鍍原料 Raw Materials for Electroplating

Electroplating refers to a surface processing method, in which a cathode part having the surface of a base material to be plated and the salt solution containing the corresponding metal cation, when the voltage is applied in the electric circuit, it deposits the metal cation on a surface of the base material through electrolysis. Electroless plating, also known as chemical plating or autocatalytic plating, is a plating method in which metal ions in a plating solution are reduced to metal and deposited on the surface of a part without an applied current by employing a suitable reducing agent. TMG Chemicals can provide customers with a variety of metal salts and additives, widely used in tin plating, copper plating and other industries.


電鍍是指在含有欲鍍金屬的鹽類溶液中﹐以被鍍基體金屬為陰極﹐通過電解作用﹐使鍍液中欲鍍金屬的陽離子 在基體金屬表面沈積出來﹐形成鍍層的一種表面加工方 法。化學鍍也稱無電解鍍或者自催化鍍,是在無外加電 流的情況下借助合適的還原劑,使鍍液中金屬離子還原 成金屬,並沈積到零件表面的一種鍍覆方法。TMG Chemicals 可以為客戶提供各種金屬鹽類及添加劑,廣 泛應用於鍍錫、鍍銅等行業。

甲基磺酸盐系列 / Metal Methanesulfonate
商品名
英文名稱
甲基磺酸錫
Stannous methanesulfonate
甲基磺酸鉍
Bismuth(III) methanesulfonate
甲基磺酸銅
Copper methanesulfonate
甲基磺酸鉛
Lead methanesulfonate
甲基磺酸銀

Silver methanesulfonate

鍍銅系列/ Copper plating
商品名
英文名稱
硫酸銅
Copper sulfate
氯化銅
Cupric chloride dihydrate
焦磷酸銅
Copper pyrophosphate
焦磷酸鉀

Potassium pyrophosphate

鍍錫系列/ Tin Plating
商品名
英文名稱
硫酸亞錫
Stannous sulfate
焦磷酸亞錫
Stannoous pyrophosphate
葡萄糖酸亞錫
Stannous gluconate
氟硼酸亞錫
Stannous fluoroborate
無水氯化亞錫

Stannous chloride anhydrous

二水氯化亞錫
Stannous chloride dihydrate
無水四氯化錫
Stannic chloride anhydrous
五水四氯化錫
Stannic chloride pentahydrate
錫酸鉀
Potassium hexahydroxostannate
錫酸鈉
Sodium hexahydroxostannate

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